Currently a micro reactor is being developed. This reactor will be based on a 2x2 cm silicon chip. For manipulations established etching techniques can be used. It will be equipped with a channel width of 300 µm and a 16 µm nickel layer. The protection layer is necessary due to the reactivity of silicon against fluorine. A very small inlet will cause the formation of micro bubbles within the reaction channels. A series of gas inlets on a single reactor chip is planned. The picture shows a chip which was used during the protection layer testing phase.